驱动电流>3mA/μm的SOI侧双极晶体管

J. Cai, T. Ning, C. D'Emic, J. Yau, K. Chan, J. Yoon, K. Jenkins, R. Muralidhar, D. Park
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引用次数: 9

摘要

在SOI上的横向硅双极晶体管中实现了创纪录的3-5mA/μm的高驱动电流。这是通过将准中性基宽缩放到10nm以下来实现的。高掺杂集电极使晶体管能够在高电平注入状态下工作,而不会产生有害的基极推出效应。测量到的截止频率对于侧双极来说是最高的,并且有一个宽的峰值,证实了它对基极推出的免疫力。本文首次报道了在全饱和区域工作的功能性互补双极环振荡器。与CMOS兼容的工艺和设计、高电流驱动能力和低电压双极逻辑的显著特点为横向SOI双极补充CMOS提供了令人兴奋的机会。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
SOI lateral bipolar transistor with drive current >3mA/μm
Record-high drive current on the order of 3-5mA/μm is demonstrated in lateral silicon bipolar transistors on SOI. This is achieved by scaling quasi-neutral base width to below 10nm. The heavily doped collector enables the transistor to operate in high level injection regime without the detrimental base push-out effect. Measured cut-off frequency is the highest for a lateral bipolar and has a broad peak, confirming its immunity to base push-out. Functional complementary bipolar ring oscillator operating in the full saturation region is reported for the first time. The salient features of CMOS-compatible process and design, high current drive capability and low voltage bipolar logic present exciting opportunities for lateral SOI bipolar to complement CMOS.
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