大功率圆柱形二极管的性能和鞘层等离子体膨胀特性

Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472) Pub Date : 2003-06-15 DOI:10.1109/PPC.2003.1277980

K. Y. Sung, W. Jeon, S. H. Chun, E. Choi, H. Uhm

{"title":"大功率圆柱形二极管的性能和鞘层等离子体膨胀特性","authors":"K. Y. Sung, W. Jeon, S. H. Chun, E. Choi, H. Uhm","doi":"10.1109/PPC.2003.1277980","DOIUrl":null,"url":null,"abstract":"Perveance and sheath plasma expansion characteristics for high power electron beams have been experimentally investigated in a cylindrical diode. An experimental scaling law for perveance in high power cylindrical diodes have been obtained in terms of anode-cathode (A-K) gap distance, d. It is found that the diode perveance in a high power cylindrical diode has a scaling law of /spl sim/d/sup -1.83/ in terms of the A-K gap distance, d, which is in close agreement with that of /spl sim/d/sup -2/ for infinite planar diode. It is also noted in high power cylindrical diode that the sheath plasma expansion speed is about 7 cm//spl mu/s at A-K gap distance of 4 mm, which is about two times faster than that in high power axial diode, in this experiment.","PeriodicalId":143385,"journal":{"name":"Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Perveance and sheath plasma expansion characteristics in high power cylindrical diode\",\"authors\":\"K. Y. Sung, W. Jeon, S. H. Chun, E. Choi, H. Uhm\",\"doi\":\"10.1109/PPC.2003.1277980\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Perveance and sheath plasma expansion characteristics for high power electron beams have been experimentally investigated in a cylindrical diode. An experimental scaling law for perveance in high power cylindrical diodes have been obtained in terms of anode-cathode (A-K) gap distance, d. It is found that the diode perveance in a high power cylindrical diode has a scaling law of /spl sim/d/sup -1.83/ in terms of the A-K gap distance, d, which is in close agreement with that of /spl sim/d/sup -2/ for infinite planar diode. It is also noted in high power cylindrical diode that the sheath plasma expansion speed is about 7 cm//spl mu/s at A-K gap distance of 4 mm, which is about two times faster than that in high power axial diode, in this experiment.\",\"PeriodicalId\":143385,\"journal\":{\"name\":\"Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)\",\"volume\":\"40 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-06-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PPC.2003.1277980\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PPC.2003.1277980","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

在圆柱形二极管中实验研究了高功率电子束的性能和鞘层等离子体膨胀特性。得到了大功率圆柱形二极管性能与正极-阴极(a - k)间隙距离d的实验标度规律，发现大功率圆柱形二极管的性能与a - k间隙距离d的标度规律为/spl sim/d/sup -1.83/，与无限平面二极管的/spl sim/d/sup -2/的标度规律非常吻合。在高功率圆柱形二极管中，当A-K间隙距离为4 mm时，鞘层等离子体的膨胀速度约为7 cm//spl mu/s，是高功率轴向二极管的2倍左右。

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Perveance and sheath plasma expansion characteristics in high power cylindrical diode

Perveance and sheath plasma expansion characteristics for high power electron beams have been experimentally investigated in a cylindrical diode. An experimental scaling law for perveance in high power cylindrical diodes have been obtained in terms of anode-cathode (A-K) gap distance, d. It is found that the diode perveance in a high power cylindrical diode has a scaling law of /spl sim/d/sup -1.83/ in terms of the A-K gap distance, d, which is in close agreement with that of /spl sim/d/sup -2/ for infinite planar diode. It is also noted in high power cylindrical diode that the sheath plasma expansion speed is about 7 cm//spl mu/s at A-K gap distance of 4 mm, which is about two times faster than that in high power axial diode, in this experiment.

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Digest of Technical Papers. PPC-2003. 14th IEEE International Pulsed Power Conference (IEEE Cat. No.03CH37472)

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