Z. Griffith, M. Rodwell, X. Fang, D. Loubychev, Ying Wu, J. Fastenau, A. Liu
{"title":"In/sub 0.53/Ga/sub 0.47/As/InP type-I DHBTs having 450 GHz f/sub T/ and GHz f/sub max/ w/C/sub cb/I/sub c/ = 0.38 ps/V","authors":"Z. Griffith, M. Rodwell, X. Fang, D. Loubychev, Ying Wu, J. Fastenau, A. Liu","doi":"10.1109/DRC.2005.1553150","DOIUrl":null,"url":null,"abstract":"The paper reports on InP/In<sub>0.53</sub>Ga<sub>0.47</sub>As /InP DHBTs fabricated using a conventional mesa structure, exhibiting a 450 GHz f<sub>tau</sub> and 490 GHz f<sub>max</sub>, which is to our knowledge the highest simultaneous f<sub>tau</sub> and f<sub>max</sub>for a mesa HBT. The collector has been scaled vertically to 120 nm for reduced electron collector transit time, aggressively scaled laterally to minimize the base-collector capacitance associated with thinner collectors, and the base and emitter contact resistances rho<sub>c</sub> have been reduced. The device reported here employs a 30 nm highly doped InGaAs base and an InGaAs/InAlAs superlattice base-collector grade","PeriodicalId":306160,"journal":{"name":"63rd Device Research Conference Digest, 2005. DRC '05.","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"63rd Device Research Conference Digest, 2005. DRC '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2005.1553150","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
In/sub 0.53/Ga/sub 0.47/As/InP type-I DHBTs having 450 GHz f/sub T/ and GHz f/sub max/ w/C/sub cb/I/sub c/ = 0.38 ps/V
The paper reports on InP/In0.53Ga0.47As /InP DHBTs fabricated using a conventional mesa structure, exhibiting a 450 GHz ftau and 490 GHz fmax, which is to our knowledge the highest simultaneous ftau and fmaxfor a mesa HBT. The collector has been scaled vertically to 120 nm for reduced electron collector transit time, aggressively scaled laterally to minimize the base-collector capacitance associated with thinner collectors, and the base and emitter contact resistances rhoc have been reduced. The device reported here employs a 30 nm highly doped InGaAs base and an InGaAs/InAlAs superlattice base-collector grade