使用$\pmb{\ mathm {ReS}_{2}}$晶体管的热辅助非易失性存储器

Natasha Goyal, D. Mackenzie, Himani Jawa, D. H. Petersen, S. Lodha
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摘要

近年来,二维材料在存储领域的应用引起了人们极大的兴趣。单层(MoL)和多层(ML) $\mathrm{MoS}_{2}$已被用于演示热辅助非易失性存储器(NVM)[5],[6]。随着单片晶圆上fet封装密度的增加,高性能ic可以达到接近370-530 K范围的工作温度[3],因此了解和利用这些材料在高温(HT)下的行为变化非常重要。热辅助NVM就是这样一种应用,利用本地产生的热量来帮助在RESET (RST/STATE 0)和WRITE (WR/STATE 1)状态之间切换[4]。在本研究中,研究了ML $\mathrm{MoS}_{2}$和$\pmb{MLReS_{2}}$中的热变滞后门操作,并对NVM应用进行了比较。由于缺乏层间耦合$\mathrm{ReS}_{2}$表现为去耦$\mathrm{MoLs}$,使其成为ML和MoL[2]的直接带隙材料$(\mathrm{E}_{\mathrm{G}}\sim 1.5\mathrm{eV})$,因此对$\mathrm{MoL}$以及ML形式的光电应用很感兴趣。我们分别在ML $\mathrm{ReS}_{2}$和$\mathrm{MoS}_{2}$的较低温度(LT)和逆时针(ACW)加上步进式电导交叉(STC)在373 K和400 K时的顺时针(CW)磁滞。类似的迟滞行为在之前的报道中只出现在500k的非常高的工作温度下[5]。STC迟滞在高温下比CW迟滞具有更低的工作电压$(\mathrm{V}_{\mathrm{p}-\mathrm{p}})$、更大的RST到WR窗口(此处定义为$\Delta \mathrm{V}_{\mathrm{th}}/\mathrm{V}_{\mathrm{p}-\mathrm{p}}$ ($\Delta \mathrm{V}_{\mathrm{th}}$为迟滞宽度))和更大的READ (RD)窗口方面的优势。表1中提到了以前NVM报告的这些参数,并与本工作进行了比较。与$\pmb{MoS_{2}}$相比,$\pmb{ ML\ ReS_{2}}$工作在更低的温度下,更低的$V_{p-p}$,并且具有更大的WR到RST和RD窗口。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Thermally Aided Nonvolatile Memory Using $\pmb{\mathrm{ReS}_{2}}$ Transistors
Recently two-dimensional (2D) materials have attracted significant research interest for memory applications. Monolayer (MoL) as well as multilayer (ML) $\mathrm{MoS}_{2}$ have been used for demonstrating thermally assisted non-volatile memories (NVM) [5], [6]. With increasing packing density of FETs on a single wafer, high performance ICs can reach an operating temperature closer to 370–530 K range [3] making it important to understand and exploit the behavioural changes in these materials at higher temperatures (HT). Thermally assisted NVM is one such application where locally generated heat is exploited to aid the switching between RESET (RST/STATE 0) and WRITE (WR/STATE 1) states [4]. In this study thermally varying hysteretic gate operation in ML $\mathrm{MoS}_{2}$ and for the first time in $\pmb{MLReS_{2}}$ is studied and compared for NVM application. Due to lack of interlayer coupling $\mathrm{ReS}_{2}$ behaves as decoupled $\mathrm{MoLs}$ making it a direct band gap material $(\mathrm{E}_{\mathrm{G}}\sim 1.5\mathrm{eV})$ for both ML and MoL [2] and hence is of interest for optoelectronic applications in $\mathrm{MoL}$ as well as ML form. We demonstrate clockwise (CW) hysteresis at lower temperatures (LT) and anticlockwise (ACW) plus step like conductance crossover (STC) hysteresis at 373 K & 400 K for ML $\mathrm{ReS}_{2}$ and $\mathrm{MoS}_{2}$ respectively. Similar hysteresis behaviour has been previously reported for MoL Mos2 only at a very high operating temperature of 500 K [5]. STC hysteresis provides an edge over CW hysteresis at HT in terms of lower operating voltages $(\mathrm{V}_{\mathrm{p}-\mathrm{p}})$, larger RST to WR window defined here as $\Delta \mathrm{V}_{\mathrm{th}}/\mathrm{V}_{\mathrm{p}-\mathrm{p}}$ (where $\Delta \mathrm{V}_{\mathrm{th}}$ is the hysteresis width) and larger READ (RD) window. These parameters for previous NVM reports are mentioned in Table 1 and compared with this work. $\pmb{ ML\ ReS_{2}}$ operates at much lower temperatures, lower $V_{p-p}$ and has larger WR to RST and RD windows as compared to $\pmb{MoS_{2}}$.
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