石墨烯中的迁移率和速度场关系

V. Dorgan, M. Bae, E. Pop
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引用次数: 2

摘要

石墨烯在未来集成电路技术中应用前景广阔。尽管在低场和低温下进行了研究,但令人惊讶的是,关于石墨烯在现代晶体管所需的实际温度和高电场下的性能的数据很少。在这项研究中,我们将石墨烯迁移率表征为300-500 K温度下载流子密度的函数。此外,在300 K和80 K的高场下,我们获得了高达2 V/µm的电子漂移速度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mobility and velocity-field relationship in graphene
Graphene holds great promise for applications in future integrated-circuit technology. Despite studies at low fields and low temperatures, surprisingly little data exists on the properties of graphene at practical temperatures and high electric fields required by modern transistors. In this study, we characterized graphene mobility as a function of carrier density at temperatures from 300–500 K. In addition, we obtained electron drift velocity at high-fields up to 2 V/µm, at both 300 K and 80 K.
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