低于60 mV/dec的铁电HZO MoS2负电容场效应晶体管,内部金属栅极:寄生电容的作用

M. Si, Chunsheng Jiang, C. Su, Y. Tang, Lingming Yang, W. Chung, Muhammad A. Alam, Peide D. Ye
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引用次数: 33

摘要

介绍了具有铁电HZO和内部金属栅极的MoS2纳米场效应管。正向和反向栅极电压扫频均获得小于50 mV/dec的SS,最小SSfor = 37.6 mV/dec,最小SSRev = 42.2 mV/dec。在铁电HZO中,由于高速动态开关,可以测量到低至8.3 mV/dec的第二最小SSrev。通过实验和动态仿真,系统地研究了寄生电容对SS和动态迟滞的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Sub-60 mV/dec ferroelectric HZO MoS2 negative capacitance field-effect transistor with internal metal gate: The role of parasitic capacitance
Steep-slope MoS2 NC-FETs with ferroelectric HZO and internal metal gate in the gate dielectric stack are demonstrated. SS less than 50 mV/dec is obtained for both forward and reverse gate voltage sweeps, with minimum SSfor = 37.6 mV/dec and minimum SSRev = 42.2 mV/dec. A second minimum of SSrev as low as 8.3 mV/dec can be measured as the result of dynamic switching at high speed in ferroelectric HZO. The impact of parasitic capacitance on SS and dynamic hysteresis is systematically studied by both experiment and dynamic simulation.
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