SiC功率mosfet的I-V、C-V及俘获特性的表征与建模

Mohammmad Sajid Nazir, A. Pampori, Yawar Hayat Zarkob, Anirban Kar, Y. Chauhan
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引用次数: 0

摘要

本文提出了一个基于物理的模型来捕获多个商用碳化硅(SiC) mosfet的电流电压(I-V)和电容电压(C-V)。一个基于电荷的核心模型已经被开发用来捕捉器件的I-V特性。对寄生电荷和寄生电容进行了经验建模,以捕捉栅极漏极电容$(C_{GD})$的C-V特性和结。为了研究陷阱行为,在多个栅极和漏极静态条件下进行了双脉冲陷阱表征。观察到阈值电压$(V_{TH})$随VGSQ正移位。此外,采用RC网络方法来模拟应力引起的器件I-V特性变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterization and Modeling of I-V, C-V and Trapping behavior of SiC Power MOSFETs
This paper presents a physics-based model to capture the current-voltage (I-V) and capacitance-voltage (C-V) of multiple commercially available Silicon Carbide (SiC) MOSFETs. A charge-based core model has been developed to capture the I-V characteristics of the devices. The parasitic charges and capacitances are modeled empirically to capture the C-V characteristics and kink in the gatedrain capacitance $(C_{GD})$. To study the trapping behavior, dual-pulse trap characterization is performed for multiple gate and drain quiescent conditions. A positive shift in threshold voltage $(V_{TH})$ with VGSQ is observed. Further, an RC network approach is implemented to model stress-induced changes in the I-V characteristics of the device.
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