H. Rulkens, E.J.J. Van Campen, J. van Herk, J. Rooda
{"title":"用动态模拟方法优化炉膛和预洁净区的批量","authors":"H. Rulkens, E.J.J. Van Campen, J. van Herk, J. Rooda","doi":"10.1109/ASMC.1998.731643","DOIUrl":null,"url":null,"abstract":"A dynamic simulation model is a powerful and fast tool to analyze existing production situations and to optimize the performance by evaluating alternative scheduling rules. This paper presents such an analysis and optimization for a furnace and pre-clean area of a wafer fab. The design of a dynamic model is described. Furthermore, experiments are described that illustrate the influence of a minimum batch size scheduling rule. For a specific production situation, the minimum batch sizes per furnace process which optimize cycle time are determined.","PeriodicalId":290016,"journal":{"name":"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"21","resultStr":"{\"title\":\"Batch size optimization of a furnace and pre-clean area by using dynamic simulations\",\"authors\":\"H. Rulkens, E.J.J. Van Campen, J. van Herk, J. Rooda\",\"doi\":\"10.1109/ASMC.1998.731643\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A dynamic simulation model is a powerful and fast tool to analyze existing production situations and to optimize the performance by evaluating alternative scheduling rules. This paper presents such an analysis and optimization for a furnace and pre-clean area of a wafer fab. The design of a dynamic model is described. Furthermore, experiments are described that illustrate the influence of a minimum batch size scheduling rule. For a specific production situation, the minimum batch sizes per furnace process which optimize cycle time are determined.\",\"PeriodicalId\":290016,\"journal\":{\"name\":\"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)\",\"volume\":\"22 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-09-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"21\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1998.731643\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1998.731643","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Batch size optimization of a furnace and pre-clean area by using dynamic simulations
A dynamic simulation model is a powerful and fast tool to analyze existing production situations and to optimize the performance by evaluating alternative scheduling rules. This paper presents such an analysis and optimization for a furnace and pre-clean area of a wafer fab. The design of a dynamic model is described. Furthermore, experiments are described that illustrate the influence of a minimum batch size scheduling rule. For a specific production situation, the minimum batch sizes per furnace process which optimize cycle time are determined.