用渗透理论描述多晶SnO/ sub2 /薄膜三维-二维过渡附近的电导率

A. Ivashchenko, I. Kerner, I. Maronchuk
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引用次数: 0

摘要

为了数值模拟多晶SnO/ sub2 /薄膜的电性能,用“平面”或“体积”电阻网络代替多晶薄膜材料。所开发的计算程序的可靠性是基于我们对纯“平面”和“体积”情况下的临界浓度C*和电导率指数t等电导率参数的评估与渗流理论预测的数值结果的一致性。计算结果与实验结果吻合较好,表明平均晶粒尺寸与薄膜厚度关系的变化可以作为控制SnO/ sub2 /半导体多晶薄膜电学性能的有效手段。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Percolation theory approach to the description of electrical conductivity near 3D-2D transition in thin polycrystalline SnO/sub 2/ films
In order to simulate numerically the electrical properties of polycrystalline SnO/sub 2/ thin films a polycrystalline film material is substituted by a "plane" or "volume" resistor network. The reliability of the developed calculation procedure is based on the coincidence of our evaluations of the electroconductivity parameters such as critical concentration C* and electrical conductivity index t in the pure "plane" and "volume" situations with numerical results predicted by the percolation theory. A good agreement between calculated and experimental data is obtained, it is shown that the variation of relation between average grain size and film thickness may serve as an effective mean to control the electrical properties of semiconducting polycrystalline films including SnO/sub 2/ polycrystalline films.
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