{"title":"在绝缘体上硅平台上实现完美成像的途径","authors":"A. Di Falco, S. C. Kehr, U. Leonhardt","doi":"10.1109/GROUP4.2011.6053771","DOIUrl":null,"url":null,"abstract":"We have designed and fabricated a Luneburg lens on Silicon-on-Insulator platform, via grayscale lithography, which implements spatial Fourier transform on the plane, independently on the angle of incidence. The presented technique can be used to fabricate perfect imaging devices.","PeriodicalId":141233,"journal":{"name":"8th IEEE International Conference on Group IV Photonics","volume":"63 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Route toward perfect imaging in Silicon-on-Insulator platform\",\"authors\":\"A. Di Falco, S. C. Kehr, U. Leonhardt\",\"doi\":\"10.1109/GROUP4.2011.6053771\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have designed and fabricated a Luneburg lens on Silicon-on-Insulator platform, via grayscale lithography, which implements spatial Fourier transform on the plane, independently on the angle of incidence. The presented technique can be used to fabricate perfect imaging devices.\",\"PeriodicalId\":141233,\"journal\":{\"name\":\"8th IEEE International Conference on Group IV Photonics\",\"volume\":\"63 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"8th IEEE International Conference on Group IV Photonics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GROUP4.2011.6053771\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"8th IEEE International Conference on Group IV Photonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GROUP4.2011.6053771","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Route toward perfect imaging in Silicon-on-Insulator platform
We have designed and fabricated a Luneburg lens on Silicon-on-Insulator platform, via grayscale lithography, which implements spatial Fourier transform on the plane, independently on the angle of incidence. The presented technique can be used to fabricate perfect imaging devices.
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