一种利用衰减非相移辅助方向图的随机方向图形成新方法

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) Pub Date : 2000-07-11 DOI:10.1109/IMNC.2000.872614

S. Nakao, A. Tokui, K. Tsujita, I. Arimoto, W. Wakamiya

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引用次数: 0

摘要

在光学图像计算的基础上，提出了一种利用衰减非相移辅助模式形成随机模式的分辨率增强技术(RET)。通过在掩模上增加ten- nps辅助模式对孤立特征进行处理，改进光照条件下的成像特性得到了很大的改善。在该RET的应用中，掩模上辅助图案的Cr孔径大小可以接近主图案的孔径大小。从而克服了传统辅助模式掩模制作的困难。

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A novel RET for random pattern formation utilizing attenuating non-phase-shift assist pattern

A novel resolution enhancement technology (RET) for random pattern formation which utilizes attenuating non-phase-shift (Atten-NPS) assist pattern is proposed based on optical image calculation. By addition of Atten-NPS assist pattern on mask for isolated Feature, much improvement of imaging characteristics is-obtained under modified illumination. In the application of this RET, Cr aperture size of assist pattern on mask can make similar to that of main pattern. Consequently, difficulty in mask fabrication for conventional assist pattern method will be overcome.

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Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

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