新兴电子器件中的溶液加工金属氧化物

Chun Zhao, Cezhou Zhao, T. Zhao
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摘要

近年来,溶液处理金属氧化物(MO)以其制备成本低、工艺简单、无真空等优点引起了广泛的关注。本文首先简要介绍了溶液法沉积金属氧化物的合成机理。然后综述了近年来在薄膜晶体管中n型溶液处理MO半导体和溶液处理MO栅极电介质的研究进展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Solution Processed Metal Oxide in Emerging Electronic Devices
Recently, solution processed metal oxide (MO) attracts wide interests due to the advantages including low-cost fabrication, procedure simplicity and vacuum-free technique. Within the paper, the synthesis mechanism of metal oxide deposited through solution process is firstly briefly introduced. Then the recent advances and progress on n-type solution processed MO semiconductors as well as the solution processed MO gate dielectrics have been reviewed for thin-film transistors.
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