基于表面电位的模型研究了纳米级GASGAA mosfet的亚阈值摆动行为,包括热载子效应

D. Faycal, A. Mohamed Amir, A. Djemai, B. Toufik
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引用次数: 2

摘要

未来奈米电子数位装置的正确设计与模拟,需要精确的亚阈值行为模型。栅极环(GAA) MOSFET被认为是缩小到50nm以下最有前途的器件之一。然而,在解决热载流子可靠性和纳米级电路设计的精确器件模型等重要问题方面仍然存在挑战。热载流子效应一直是影响纳米MOS晶体管亚阈值性能长期稳定的主要问题。因此,本文基于二维泊松方程(柱面坐标)的解析解(含热载流子项),推导了低漏源极电压下未掺杂GAA mosfet亚阈值摆幅的基于表面电位的解析模型。通过与二维数值模拟的对比,验证了新模型的正确性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface- potential- based model to study the subthreshold swing behavior including hot-carrier effect for nanoscale GASGAA MOSFETs
The proper design and simulation of future nanoelectronics digital devices requires accurate models of subthreshold behavior. The Gate All Around (GAA) MOSFET is considered one the most promising devices for downscaling below 50 nm. However, challenges still remain to resolve the important issues particularly concerning hot-carrier reliability and accurate device models for nanoscale circuit designs. Hot-carrier effects have been the major issues in the long-term stability of subthreshold performances in a nanoscale MOS transistor. Therefore, in this paper an analytical, surface-potential-based, model for the subthreshold swing of undoped GAA MOSFETs has been derived at low drain-source voltage based on an analytical solution of the two-dimensional Poisson equation (in cylindrical coordinates) with the hot carrier term included. The new model has been verified by comparison with 2-D numerical simulations.
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