{"title":"掺杂碳异质结构双极晶体管初始电流增益增加机理","authors":"J. Chi, K. Lu","doi":"10.1109/GAASRW.1997.657046","DOIUrl":null,"url":null,"abstract":"This talk reports a new finding that after the initial rise, the current gain of carbon-doped AlGaAs/GaAs HBTs can be re-initiated by a 200-300/spl deg/C annealing under no bias. The re-initiating is nondestructive and reproducible, therefore permitting unambiguous study of the phenomenon. A simple physical model was described to explains all the experimental results obtained on the re-initiation phenomenon.","PeriodicalId":271248,"journal":{"name":"1997 GaAs Reliability Workshop. Proceedings","volume":"53 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"Mechanism for the initial current gain increase in carbon-doped heterostructure bipolar transistors\",\"authors\":\"J. Chi, K. Lu\",\"doi\":\"10.1109/GAASRW.1997.657046\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This talk reports a new finding that after the initial rise, the current gain of carbon-doped AlGaAs/GaAs HBTs can be re-initiated by a 200-300/spl deg/C annealing under no bias. The re-initiating is nondestructive and reproducible, therefore permitting unambiguous study of the phenomenon. A simple physical model was described to explains all the experimental results obtained on the re-initiation phenomenon.\",\"PeriodicalId\":271248,\"journal\":{\"name\":\"1997 GaAs Reliability Workshop. Proceedings\",\"volume\":\"53 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-10-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1997 GaAs Reliability Workshop. Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GAASRW.1997.657046\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 GaAs Reliability Workshop. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GAASRW.1997.657046","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Mechanism for the initial current gain increase in carbon-doped heterostructure bipolar transistors
This talk reports a new finding that after the initial rise, the current gain of carbon-doped AlGaAs/GaAs HBTs can be re-initiated by a 200-300/spl deg/C annealing under no bias. The re-initiating is nondestructive and reproducible, therefore permitting unambiguous study of the phenomenon. A simple physical model was described to explains all the experimental results obtained on the re-initiation phenomenon.