SiGe HBTs长期正偏运行时加速度参数及可靠性研究

P. Rosenthal, B. Paine, N. T. Kubota, D. Sunderland
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引用次数: 2

摘要

我们对采用IBM SiGe5HP HBT技术制造的离散HBT进行了加速寿命测试,并确定了损耗与发射极互连温度和电流密度的依赖关系。损耗是由于基极电流增大导致直流电流增益/spl β /的降低而引起的。/spl β /退化的特征和参数依赖性与IBM最初开发的电迁移(EM)机制一致。发射极互连中的电磁在发射极半导体上产生压应力,足以改变半导体能带结构,导致基极电流增加和相关的/spl β /降低。利用我们的经验确定的加速度参数,我们估计了在典型使用条件下/spl beta/最坏情况下的预期变化(125 /spl度/C, J/sub i/=1.0 mA//spl mu/m/sup 2/)。结果表明,经过20年/spl β /将降低约17/spl + usmn/1%。这种退化对于大多数IC应用来说是微不足道的,因此我们得出结论,该技术在长期正向有源偏置操作期间是高度可靠的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Acceleration parameters and reliability of SiGe HBTs during long-term forward-biased operation
We have conducted accelerated lifetesting on discrete HBTs fabricated with the IBM SiGe5HP HBT technology, and determined the dependence of the wear-out on emitter interconnect temperature and current density. The wearout occurred by degradation of DC current gain, /spl beta/, caused by increase of the base current. The characteristics and the parametric dependences of the /spl beta/ degradation were consistent with an electromigration (EM) mechanism originally developed by IBM. EM in the emitter interconnects causes compressive stress on the emitter semiconductor sufficient to alter the semiconductor energy band structure, leading to an increase in base current and associated reduction in /spl beta/. Utilizing our empirically determined acceleration parameters, we have estimated the worst-case expected changes in /spl beta/ during typical use conditions (125 /spl deg/C, J/sub i/=1.0 mA//spl mu/m/sup 2/). The results showed that after 20 years /spl beta/ would degrade by approximately 17/spl plusmn/1%. This degradation is insignificant for most IC applications, and we therefore conclude that this technology is highly reliable during long-term forward-active bias operation.
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