利用深能级光谱学检测氮化镓中与碳相关的带隙态

S. Ringel, A. Armstrong, A. Arehart, B. Moran, U. Mishra, J. Speck
{"title":"利用深能级光谱学检测氮化镓中与碳相关的带隙态","authors":"S. Ringel, A. Armstrong, A. Arehart, B. Moran, U. Mishra, J. Speck","doi":"10.1109/ISCS.2003.1239877","DOIUrl":null,"url":null,"abstract":"We present the application of deep level optical spectroscopy (DLOS) to detect carbon-related shallow and deep traps in semi-insulating nitride layers. To charactrise GaN layers with an intentionally wide range of carbon incorporation, were made on atmospheric pressure (AP) and low pressure(LP). Secondary Ion Mass Spectroscopy (SIMS) was used to confirm that LP MOCVD GaN layers incorporated a significantly higher carbon concentration compared to AP MOCVD layers.","PeriodicalId":404065,"journal":{"name":"2003 International Symposium on Compound Semiconductors","volume":"34 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Detection of carbon-related bandgap states in GaN using deep level optical spectroscopy\",\"authors\":\"S. Ringel, A. Armstrong, A. Arehart, B. Moran, U. Mishra, J. Speck\",\"doi\":\"10.1109/ISCS.2003.1239877\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present the application of deep level optical spectroscopy (DLOS) to detect carbon-related shallow and deep traps in semi-insulating nitride layers. To charactrise GaN layers with an intentionally wide range of carbon incorporation, were made on atmospheric pressure (AP) and low pressure(LP). Secondary Ion Mass Spectroscopy (SIMS) was used to confirm that LP MOCVD GaN layers incorporated a significantly higher carbon concentration compared to AP MOCVD layers.\",\"PeriodicalId\":404065,\"journal\":{\"name\":\"2003 International Symposium on Compound Semiconductors\",\"volume\":\"34 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-10-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2003 International Symposium on Compound Semiconductors\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISCS.2003.1239877\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 International Symposium on Compound Semiconductors","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISCS.2003.1239877","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

摘要

我们提出了应用深能级光学光谱(DLOS)来探测半绝缘氮化物层中与碳相关的浅阱和深阱。为了表征具有广泛碳掺入范围的氮化镓层,在常压(AP)和低压(LP)下制备。二次离子质谱(SIMS)证实,LP MOCVD GaN层的碳浓度明显高于AP MOCVD层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Detection of carbon-related bandgap states in GaN using deep level optical spectroscopy
We present the application of deep level optical spectroscopy (DLOS) to detect carbon-related shallow and deep traps in semi-insulating nitride layers. To charactrise GaN layers with an intentionally wide range of carbon incorporation, were made on atmospheric pressure (AP) and low pressure(LP). Secondary Ion Mass Spectroscopy (SIMS) was used to confirm that LP MOCVD GaN layers incorporated a significantly higher carbon concentration compared to AP MOCVD layers.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信