晶圆键合:概述

U. Gosele, M. Reiche, Q. Tong
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引用次数: 4

摘要

晶圆键合最初是制造廉价的高质量厚(>1 /spl μ m)薄膜绝缘体上硅(SOI)材料的一种特殊方法。同时,也可以通过晶圆键合和适当的减薄技术制备超薄SOI层。此外,硅晶圆键合已被证明是制造传感器和执行器的通用技术。特别是在这个区域,需要在尽可能低的温度下进行键合。晶圆键合也可用于生产结构、结晶度或晶格常数不同的材料组合。最后一个特征允许制造III-V化合物组合,这些组合不是晶格匹配的,可以用于垂直腔面发射激光器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Wafer bonding: an overview
Wafer bonding started as a specific way to fabricate inexpensive thick (>1 /spl mu/m) film silicon-on-insulator (SOI) materials of high quality. In the meantime, also ultrathin SOI layers can be produced by wafer bonding and proper thinning techniques. In addition, silicon wafer bonding has shown to be a versatile technique for fabricating sensors and actuators. Especially in this area it is desirable to perform bonding at a temperature as low as possible. Wafer bonding may also be used to produce combinations of materials which may differ in terms of structure, crystallinity or lattice constant. The last feature allows the fabrication of III-V compound combinations which are not lattice matched and may be used for vertical cavity surface emitting lasers.
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