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hf基高k介电材料

Extended Abstracts of International Workshop on Gate Insulator (IEEE Cat. No.03EX765) Pub Date : 2003-12-19 DOI:10.1109/IWGI.2003.159171
Jack C. Lee
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引用次数: 4

摘要

我们报告了高温形成气体和氘退火对性能和可靠性特性的影响以及交流和直流应力对偏温不稳定性和时变介电击穿的影响的最新结果。
本文章由计算机程序翻译，如有差异，请以英文原文为准。
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Hf-based high-K dielectrics
We report recent results on the effects of high-temperature forming gas and deuterium anneals on performance and reliability characteristics and the effects of AC and DC stress on bias-temperature instability and time-dependent dielectrics breakdown.
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Extended Abstracts of International Workshop on Gate Insulator (IEEE Cat. No.03EX765)
Extended Abstracts of International Workshop on Gate Insulator (IEEE Cat. No.03EX765)
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