金属颗粒的高能激光清洗和二氧化硅光学表面损伤:潜在机制的研究

N. Shen, S. Demos, R. Negres, A. Rubenchik, C. Harris, M. Matthews
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引用次数: 2

摘要

光学元件表面颗粒污染会导致激光损伤,从而限制了高功率激光系统的性能。在这项工作中,我们的重点是了解导致金属污染物引发损伤的基本机制。利用时间分辨显微镜和等离子体光谱技术,研究了1064 nm (10 ns)和3555 nm (8 ns)激光脉冲辐照下,熔融石英衬底出口表面喷射出~30 μm不锈钢颗粒的动态过程。利用时间分辨等离子体发射光谱研究了单次10ns脉冲激光烧蚀与透明基底结合的金属颗粒的能量耦合和温升。观察到与铁(I)发射线相关的等离子体在~220 ns内从< 24000 K冷却到~ 15000 K, τ-0.22与相对自由等离子体的辐射损失和绝热气体膨胀一致。与Fe(I)等离子体相比,Si(II)等离子体腐蚀SiO2衬底的同时发射线产生了更高的等离子体温度,约35000 K。当粒子喷射时,物质温度的差异与微球-衬底界面上的等离子体约束一致,并且可以使用泵浦探针阴影成像作为脉冲激光能量的函数直接可视化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Energetic laser cleaning of metallic particles and surface damage on silica optics: investigation of the underlying mechanisms
Surface particulate contamination on optics can lead to laser-induced damage hence limit the performance of high power laser system. In this work we focus on understanding the fundamental mechanisms that lead to damage initiation by metal contaminants. Using time resolved microscopy and plasma spectroscopy, we studied the dynamic process of ejecting ~30 μm stainless steel particles from the exit surface of fused silica substrate irradiated with 1064 nm, 10 ns and 355 nm, 8 ns laser pulses. Time-resolved plasma emission spectroscopy was used to characterize the energy coupling and temperature rise associated with single, 10-ns pulsed laser ablation of metallic particles bound to transparent substrates. Plasma associated with Fe(I) emission lines originating from steel microspheres was observe to cool from <24,000 K to ~15,000 K over ~220 ns as τ-0.22, consistent with radiative losses and adiabatic gas expansion of a relatively free plasma. Simultaneous emission lines from Si(II) associated with the plasma etching of the SiO2 substrate were observed yielding higher plasma temperatures, ~35,000 K, relative to the Fe(I) plasma. The difference in species temperatures is consistent with plasma confinement at the microsphere-substrate interface as the particle is ejected, and is directly visualized using pump-probe shadowgraphy as a function of pulsed laser energy.
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