{"title":"δ掺杂层对肖特基二极管参数的影响","authors":"J. Osvald","doi":"10.1109/ASDAM.2000.889528","DOIUrl":null,"url":null,"abstract":"We studied the influence of planar /spl delta/-doping on the parameters of Schottky diodes. It is shown that a /spl delta/-layer with the same type of conductivity as a base semiconductor material has no significant influence on the diode parameters. Changing the potential barrier shape after insertion of the /spl delta/-doped layer influences the diode current only slightly. Significant changes were found for Schottky diodes with /spl delta/-doped layers of opposite type conductivity compared with the base semiconductor. The resulting barriers are higher and depend on both the /spl delta/-doped layer position and the doping concentration.","PeriodicalId":303962,"journal":{"name":"ASDAM 2000. Conference Proceedings. Third International EuroConference on Advanced Semiconductor Devices and Microsystems (Cat. No.00EX386)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Delta-doped layer influence on Schottky diodes parameters\",\"authors\":\"J. Osvald\",\"doi\":\"10.1109/ASDAM.2000.889528\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We studied the influence of planar /spl delta/-doping on the parameters of Schottky diodes. It is shown that a /spl delta/-layer with the same type of conductivity as a base semiconductor material has no significant influence on the diode parameters. Changing the potential barrier shape after insertion of the /spl delta/-doped layer influences the diode current only slightly. Significant changes were found for Schottky diodes with /spl delta/-doped layers of opposite type conductivity compared with the base semiconductor. The resulting barriers are higher and depend on both the /spl delta/-doped layer position and the doping concentration.\",\"PeriodicalId\":303962,\"journal\":{\"name\":\"ASDAM 2000. Conference Proceedings. Third International EuroConference on Advanced Semiconductor Devices and Microsystems (Cat. No.00EX386)\",\"volume\":\"24 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-10-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ASDAM 2000. Conference Proceedings. Third International EuroConference on Advanced Semiconductor Devices and Microsystems (Cat. No.00EX386)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASDAM.2000.889528\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ASDAM 2000. Conference Proceedings. Third International EuroConference on Advanced Semiconductor Devices and Microsystems (Cat. No.00EX386)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASDAM.2000.889528","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Delta-doped layer influence on Schottky diodes parameters
We studied the influence of planar /spl delta/-doping on the parameters of Schottky diodes. It is shown that a /spl delta/-layer with the same type of conductivity as a base semiconductor material has no significant influence on the diode parameters. Changing the potential barrier shape after insertion of the /spl delta/-doped layer influences the diode current only slightly. Significant changes were found for Schottky diodes with /spl delta/-doped layers of opposite type conductivity compared with the base semiconductor. The resulting barriers are higher and depend on both the /spl delta/-doped layer position and the doping concentration.