二维各向异性刻蚀模拟器在石英晶圆穿孔刻蚀中的应用

2011 IEEE SENSORS Proceedings Pub Date : 2011-10-01 DOI:10.1109/ICSENS.2011.6127322

M. Zhao, H. Oigawa, J. Ji, T. Ueda

{"title":"二维各向异性刻蚀模拟器在石英晶圆穿孔刻蚀中的应用","authors":"M. Zhao, H. Oigawa, J. Ji, T. Ueda","doi":"10.1109/ICSENS.2011.6127322","DOIUrl":null,"url":null,"abstract":"This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.","PeriodicalId":201386,"journal":{"name":"2011 IEEE SENSORS Proceedings","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer\",\"authors\":\"M. Zhao, H. Oigawa, J. Ji, T. Ueda\",\"doi\":\"10.1109/ICSENS.2011.6127322\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.\",\"PeriodicalId\":201386,\"journal\":{\"name\":\"2011 IEEE SENSORS Proceedings\",\"volume\":\"18 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 IEEE SENSORS Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSENS.2011.6127322\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 IEEE SENSORS Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSENS.2011.6127322","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

本文介绍了一种新型各向异性刻蚀模拟器的特点及其在石英晶圆穿孔刻蚀形状预测中的应用。设计了处理穿孔后蚀刻的专用流程图和相关工艺。本文给出了其在z板和at板石英晶体上的两个应用实例和一个应用实例，以说明其良好的性能。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer

This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

2011 IEEE SENSORS Proceedings

自引率

0.00%

发文量