{"title":"可变占空比的依赖偏振的塔尔博特效应","authors":"Shubin Li, Changhe Zhou, G. Barbastathis","doi":"10.1109/OMN.2014.6924584","DOIUrl":null,"url":null,"abstract":"It has recently been observed that the location of Talbot planes becomes dependent on polarization of the incident light for grating periods in the rage of 2~3 free-space wavelengths. Here, we investigate the effect of grating duty cycle and its potential use for control of two- or three-dimensional pattern formation in nanolithography.","PeriodicalId":161791,"journal":{"name":"2014 International Conference on Optical MEMS and Nanophotonics","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Polarization-dependent Talbot effect with variable duty cycle\",\"authors\":\"Shubin Li, Changhe Zhou, G. Barbastathis\",\"doi\":\"10.1109/OMN.2014.6924584\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"It has recently been observed that the location of Talbot planes becomes dependent on polarization of the incident light for grating periods in the rage of 2~3 free-space wavelengths. Here, we investigate the effect of grating duty cycle and its potential use for control of two- or three-dimensional pattern formation in nanolithography.\",\"PeriodicalId\":161791,\"journal\":{\"name\":\"2014 International Conference on Optical MEMS and Nanophotonics\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 International Conference on Optical MEMS and Nanophotonics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/OMN.2014.6924584\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 International Conference on Optical MEMS and Nanophotonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMN.2014.6924584","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Polarization-dependent Talbot effect with variable duty cycle
It has recently been observed that the location of Talbot planes becomes dependent on polarization of the incident light for grating periods in the rage of 2~3 free-space wavelengths. Here, we investigate the effect of grating duty cycle and its potential use for control of two- or three-dimensional pattern formation in nanolithography.
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