14Nm块体和SOI finfets Sram细胞中单事件扰流的栅极长度依赖性

Jingyi Liu, X. An, Gensong Li, Zhexuan Ren, Kunlei Gu, Ru Huang
{"title":"14Nm块体和SOI finfets Sram细胞中单事件扰流的栅极长度依赖性","authors":"Jingyi Liu, X. An, Gensong Li, Zhexuan Ren, Kunlei Gu, Ru Huang","doi":"10.1109/CSTIC52283.2021.9461413","DOIUrl":null,"url":null,"abstract":"In this paper, the impact of gate length on Single Event Upset (SEU) characteristics of 14 nm bulk and SOI FinFET 6T SRAM is investigated and compared by mixed-mode 3D TCAD simulation. Simulation results show that for both bulk and SOI FinFET SRAM cells, the threshold linear energy transfer (LETth) decreases with decreasing the gate length. The LETth of SOI FinFET SRAM is larger but decreases more rapidly compared with bulk FinFET SRAM. Besides, the critical charges (Qe-«) and collected charges (Qeen) are analyzed to explain the gate length dependence of LETth in FinFET SRAM cells. The results imply that as the gate length shrinks, the SEU susceptibility of bulk and SOI FinFET SRAM becomes more severe, especially for SOI FinFET SRAM.","PeriodicalId":186529,"journal":{"name":"2021 China Semiconductor Technology International Conference (CSTIC)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The Gate Length Dependence of Single Event Upset in 14Nm Bulk and SOI Finfetc Sram Cells\",\"authors\":\"Jingyi Liu, X. An, Gensong Li, Zhexuan Ren, Kunlei Gu, Ru Huang\",\"doi\":\"10.1109/CSTIC52283.2021.9461413\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, the impact of gate length on Single Event Upset (SEU) characteristics of 14 nm bulk and SOI FinFET 6T SRAM is investigated and compared by mixed-mode 3D TCAD simulation. Simulation results show that for both bulk and SOI FinFET SRAM cells, the threshold linear energy transfer (LETth) decreases with decreasing the gate length. The LETth of SOI FinFET SRAM is larger but decreases more rapidly compared with bulk FinFET SRAM. Besides, the critical charges (Qe-«) and collected charges (Qeen) are analyzed to explain the gate length dependence of LETth in FinFET SRAM cells. The results imply that as the gate length shrinks, the SEU susceptibility of bulk and SOI FinFET SRAM becomes more severe, especially for SOI FinFET SRAM.\",\"PeriodicalId\":186529,\"journal\":{\"name\":\"2021 China Semiconductor Technology International Conference (CSTIC)\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2021-03-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2021 China Semiconductor Technology International Conference (CSTIC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CSTIC52283.2021.9461413\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 China Semiconductor Technology International Conference (CSTIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSTIC52283.2021.9461413","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文通过混合模式三维TCAD仿真,研究了栅极长度对14nm块体和SOI FinFET 6T SRAM单事件扰动(SEU)特性的影响。仿真结果表明,对于体型和SOI型FinFET SRAM单元,阈值线性能量传递(leth)随栅极长度的减小而减小。SOI FinFET SRAM的lth比体FinFET SRAM更大,但下降速度更快。此外,还分析了临界电荷(Qe-«)和收集电荷(皇后),以解释FinFET SRAM电池中leth的栅极长度依赖性。结果表明,随着栅极长度的减小,本体和SOI FinFET SRAM的SEU敏感性变得更加严重,特别是SOI FinFET SRAM。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The Gate Length Dependence of Single Event Upset in 14Nm Bulk and SOI Finfetc Sram Cells
In this paper, the impact of gate length on Single Event Upset (SEU) characteristics of 14 nm bulk and SOI FinFET 6T SRAM is investigated and compared by mixed-mode 3D TCAD simulation. Simulation results show that for both bulk and SOI FinFET SRAM cells, the threshold linear energy transfer (LETth) decreases with decreasing the gate length. The LETth of SOI FinFET SRAM is larger but decreases more rapidly compared with bulk FinFET SRAM. Besides, the critical charges (Qe-«) and collected charges (Qeen) are analyzed to explain the gate length dependence of LETth in FinFET SRAM cells. The results imply that as the gate length shrinks, the SEU susceptibility of bulk and SOI FinFET SRAM becomes more severe, especially for SOI FinFET SRAM.
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