考虑非弹道导通的CNTFET电流-电压特性:栅极氧化物厚度的影响

N. T. Rouf, Ashfaqul Haq Deep, Rusafa Binte Hassan, S. Khan, M. Hasan, S. M. Mominuzzaman
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引用次数: 7

摘要

目前,碳纳米管被认为是现有硅技术的一个有前景的替代品。目前,硅技术的发展速度因其材料问题和尺度限制而明显放缓,因此碳纳米管受到了世界各地研究人员的关注。本文广泛研究了栅极氧化物厚度对非弹道导电碳纳米管场效应晶体管(CNTFET)性能的影响。本研究发现,随着栅极氧化层厚度的增加,考虑非弹道导通的CNTFET输出电流显著下降。除此之外,为了更好地感知非弹道传导效应,本实验获得的结果与先前报道的具有弹道传导数据的CNTFET进行了比较。此外,本工作还计算并绘制了通断状态电流比,以进一步对比CNTFET的弹道和非弹道传导。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Current-voltage characteristics CNTFET considering non-ballistic conduction: Effect of gate oxide thickness
Carbon nanotube is being considered as a prospective alternative for the existing Silicon technology in present days. The advancement of Silicon technology, at present, has slowed down considerably because of its various material issues and scaling limitations and so, carbon nanotubes have gained the attention of researchers around the world over. In this literature, the effect of gate oxide thickness on the performance of carbon nanotube field effect transistor (CNTFET) with non-ballistic conduction is extensively investigated. It is found in this study that with the increase of the gate oxide thickness, the current output of CNTFET considering non-ballistic conduction deteriorates by a significant amount. In addition to this, the results obtained from this experiment are compared with previously reported CNTFET with ballistic conduction data for a better perception of the non-ballistic conduction effects. Also, the on and off state current ratios have been calculated and plotted in this work to further contrast the ballistic and non-ballistic conduction of CNTFET.
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