混合显影方式对CD均匀性的影响

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797524

H. Nakamura, T. Ema, K. Hayasaki, S. Ito, K. Okumura

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引用次数: 3

摘要

要求晶圆尺寸更大，图案尺寸更细，晶圆尺寸更大需要更宽区域的CD均匀性，图案尺寸更细需要更均匀的CD。发现混合显影方法可以改善CD的均匀性。效果将被报告。

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The effect of mixing development method on CD uniformity

It is required that the wafer size is bigger and the pattern size is finer, Bigger wafer size needs the CD uniformity in wider area and finer pattern size needs more uniform CDs. Mixing development method was found to improve CD uniformity. The effect will be reported.

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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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