用核微探针直接测量DRAM井结构的软误差抗扰度

Y. Ohno, T. Kishimoto, K. Sonoda, H. Sayama, S. Komori, A. Kinomura, Y. Horino, K. Fujii, T. Nishimura, M. Takai, H. Miyoshi
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引用次数: 0

摘要

论证了核微探针的软误差评价方法。该方法实现了引起软误差事件的电荷收集的定量研究。与p/sup -/epi/p/sup +/基板上的常规井结构相比,双埋p/sup +/层的逆行井结构对dram的软误差免疫更有效。仿真结果很好地证明了这些结果。高能核微探针评价方法为先进dram的软误差抗扰性优化提供了理论依据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Direct measurement of the soft-error immunity on the DRAM well structure by using the nuclear microprobe
The soft-error evaluation method using the nuclear microprobe has been demonstrated. This method realized the quantitative study of the charge collection which induces the soft-error event. The retrograde well structure with the double buried p/sup +/ layers was found to be more effective for the soft-error immunity of DRAMs, as compared with the conventional well structure on the p/sup -/epi/p/sup +/ substrate. These results were well proved by the simulation results. The evaluation method using high-energy nuclear microprobe gives the principle to optimize the well structure for the soft-error immunity of advanced DRAMs.
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