总剂量和RT退火对反熔丝FPGA启动电流瞬态的影响

J. Wang, R. Katz, I. Kleyner, F. Kleyner, J. Sun, W. Wong, J. Mccollum, B. Cronquist
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引用次数: 1

摘要

在电离辐射效应的背景下,研究了反熔丝现场可编程门阵列(FPGA)器件A1280A的启动电流。如果测量得当,在一定的辐照量后,可以识别出辐射诱导启动瞬态(RIST)。RIST随总剂量(TID)增加,并强烈依赖于剂量率。几天的室温偏置退火可以将RIST降低到非常低的水平。提出了一种晶体管级机制来阐明RIST的起源。NMOS二极管的电离致漏被认为是根本原因。当设备上电时,电荷泵的斜坡速度下降导致RIST。SPICE模拟也证明了NMOS二极管的泄漏会减慢斜坡速度。在典型的低剂量率空间环境中,RIST不是总剂量耐受的限制因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Total dose and RT annealing effects on startup current transient in antifuse FPGA
The startup current in an antifuse field programmable gate array (FPGA) device, A1280A, is investigated in the context of ionizing radiation effects. If properly measured, a radiation induced startup transient (RIST) can be identified after certain amount of irradiation. RIST increases with total dose (TID), and is strongly dependent on the dose rate. Room-temperature biased annealing for few days can reduce RIST to a very low level. A transistor-level mechanism is proposed to elucidate the origin of RIST. The ionization induced leakage in the NMOS diode is believed to be the root cause. The degradation of the ramping speed of the charge pump causes RIST when powering up the device. SPICE simulation was also performed to demonstrate the slow down of the ramping speed by the leakage in the NMOS diode. In typical low-dose-rate space environments, RIST is not the limiting factor for the total dose tolerance.
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