应力氧化物中协同缺陷的实验证据和统计建模[FLASH存储器实例]

F. Driussi, D. Esseni, L. Selmi, M. van Duuren, F. Widdershoven
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引用次数: 3

摘要

本文报道了从大型FLASH电池阵列中提取的应力诱导泄漏电流(SILC)的实验数据,表明应力隧道氧化物中可能存在两种类型的缺陷。为了支持这一解释,对大型电池阵列中合作缺陷的产生和电流传导进行了分析和数值分析。结果表明,两个协同缺陷的平均数量随单个缺陷的平均数量呈二次增长。这与实验观察一致,即在重应力条件下,每个单元的平均缺陷数与应力持续时间呈超线性依赖关系。数值模拟定性再现了存储器阵列中实验的所有主要特征,从而证实了基于协同缺陷的解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Experimental evidence and statistical modeling of cooperating defects in stressed oxides [FLASH memory example]
This work reports experimental data of stress induced leakage current (SILC) extracted from large FLASH cell arrays that indicate the possible presence of two types of defects in the stressed tunnel oxides. In order to support this interpretation, both an analytical and a numerical analysis of the generation and of the current conduction of cooperating defects in large arrays of cells have been developed. Our results demonstrate that the average number of two cooperating defects increases quadratically with the average number of single defects. This is in agreement with the experimental observation that the average number of defects per cell exhibits a super-linear dependence on the duration of the stress, for heavy stress conditions. The numerical simulations qualitatively reproduce all the main features of the experiments in the memory array, thus confirming the interpretation based on cooperating defects.
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