一种新型二维晶体:二硒化锡(SnSe2)的费米能级可调性

Mingda Li, S. Xiao, R. Yan, S. Vishwanath, S. Fullerton‐Shirey, D. Jena, H. Xing
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引用次数: 1

摘要

二硒化锡(SnSe2)是一种二维层状晶体,常见于八面体配位(1T相)中。据报道,它具有5.1 eV左右的高电子亲和力和1 eV的带隙[1-2],可以在thin - tfet中与二硒化钨(WSe2)形成交错带取向[3]。然而,它缺乏门调制仍然是一个谜[4]。在这项工作中,我们通过使用聚合物电解质PEO:CsClO4反掺杂来研究SnSe2的费米能级可调性。这种反掺杂技术将SnSe2场效应晶体管(FET)的通/关比从2倍提高到50倍,创历史新高。同时,为了拟合实验数据,提出了离子掺杂和子隙态密度(DOS)的SnSe2场效应管器件模型。提取的类受体子隙态有效数量高达4.16 × 1019 cm-3(非晶薄膜晶体管提取的有效数量接近5 × 1017 cm-3[5])。这可以解释SnSe2的弱费米能级可调性,并指导未来材料发展到tfet。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fermi level tunability of a novel 2D crystal: Tin Diselenide (SnSe2)
Tin Diselenide (SnSe2) is a two-dimensional layered crystal commonly found in octahedral coordination (1T phase). It has been reported to have a high electron affinity of around 5.1 eV and a bandgap of 1 eV [1-2], which can form staggered band alignment with tungsten diselenide (WSe2) in Thin-TFETs [3]. However, its lack of gate modulation remains a mystery [4]. In this work, we investigate the Fermi level tunability of SnSe2 by counter doping using a polymer electrolyte, PEO:CsClO4. This counter doping technique increases the on/off ratio of SnSe2 field effect transistor (FET) from 2 times to 50 times, a record high value. Meanwhile, a device model of SnSe2 FET with ion doping and subgap density of states (DOS) has been proposed to fit the experimental data. The extracted effective number of acceptor-like subgap states is as high as 4.16 × 1019 cm-3 (in comparison with near 5 × 1017 cm-3 extracted for amorphous thin-film transistors [5]). This can explain the weak Fermi level tunability of SnSe2 and direct future material development towards TFETs.
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