包含量子约束、能带结构效应和准弹道输运的纳米线mosfet漏极电流分析模型:器件到电路性能分析

J. Dura, S. Martinie, D. Munteanu, F. Triozon, S. Barraud, Y. Niquet, J. Autran
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引用次数: 11

摘要

本文提出了纳米线mosfet漏极电流的解析模型(图1)。该架构旨在用于高达11nm以下技术节点的超尺度器件,并使用几纳米厚度的硅膜。在这些维度上,一些新出现的物理现象不能再被忽视:短通道效应(SCE)和准弹道输运(两者都是由于通道长度减少)和量子约束和带结构效应(BSE),由于强硅纳米线变薄。我们的漏极电流分析模型包括了所有这些物理现象。通过数值模拟和实验数据对该模型进行了比较和验证。最后,在电路层面上进行了一项研究,以评估BSE和准弹道输运对小型电路性能的影响,如基于终极纳米线mosfet的CMOS逆变器和环形振荡器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytical model of drain current in nanowire MOSFETs including quantum confinement, band structure effects and quasi-ballistic transport: device to circuit performances analysis
This paper presents an analytical model of the drain current in nanowire MOSFETs (Fig. 1). This architecture is aimed for ultra-scaled devices up to technology nodes sub-11nm and uses silicon films of a few nanometers in thickness. At these dimensions, some emerging physical phenomena can no more be neglected: short-channel effects (SCE) and quasi-ballistic transport (both due to the channel length reduction) and quantum confinement and band structure effects (BSE), due to the strong silicon nanowire thinning. Our analytical model of the drain current includes all these physical phenomena. The proposed model is compared and validated on numerical simulations and experimental data. Finally, a study at the circuit level is performed to assess the impact of BSE and quasi-ballistic transport on the performances of small circuits such as CMOS inverters and ring oscillators based on ultimate nanowire MOSFETs.
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