射频离子源的发展及其应用

M. Abdelaziz, S. Zakhary
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摘要

本文综述了射频离子源的主要研究进展。这些发展是为了加强等离子体,改善离子束质量和增加离子束中高电荷离子种类的范围。在径向抽提型中,将离子束抽提的合适位置尽量靠近放电瓶中最高等离子体强度,以便抽提高离子电流,以强化等离子体,增加从放电中抽提的离子电流。机械收缩,浸入轴向磁场和一个简单的电子枪密封,以注入电子(足够的能量/spl sim/150 eV)到等离子体。在宽束射频离子源中,通过使用多孔径石墨阴极,其出口孔径分布进行性能匹配,提高了光束均匀性。另一方面,在真空电弧离子源(冷阴极型)中插入射频天线降低了点火电压,并允许在较低的提取电压(50至300 V)下提取较高的离子电流。本文还简要回顾了射频离子源已经使用或可能安装的主要工业过程。这些过程用于去除,沉积以及材料的改性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Development of radio frequency ion sources and their applications
In this paper a review is made of the main developments of RF ion sources. These developments are directed towards intensifying the plasma, improving the ion beam quality and increasing the extent of the highly charged ion species in the ion beam. In the radial extraction type, the proper position for ion beam extraction is made as near as possible to the highest plasma intensity in the discharge bottle to allow for extraction of high ion current in order to intensify the plasma and increase the extracted ion current from the discharge, the discharge bottle was made with: a mechanical constriction, immersed in the axial magnetic field and a simple electron gun is sealed with it to inject electrons (with sufficient energy /spl sim/150 eV) into the plasma. Improving the beam uniformity is achieved in the broad beam RF ion source through the use of a multi-aperture graphite cathode with exit apertures distributed to perform perveance matching. On the other hand, the insertion of the RF antenna in the vacuum arc ion source (cold cathode type) reduces the ignition voltage and allows for extraction of higher ion currents at lower extraction voltages (50 up to 300 V). Also in this article a brief review is given of the main industrial processes in which RF ion sources have already been used or are potentially fitted. These processes are used for removal, deposition as well as modification of material.
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