热冲击和热NF/sub - 3/原位炉清洗

Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop Pub Date : 1995-11-13 DOI:10.1109/ASMC.1995.484378

B. Metteer

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引用次数: 0

摘要

SEMATECH和SEMATECH赞助的研究的初步结果表明，成功的商业热冲击和热NF/sub - 3/原位清洗炉工艺室的前景广阔。在标准扩散炉上使用这些技术是高度灵活的，这取决于生产设备当前的产能和工艺条件。SEMATECH旨在优化这两种方法的研究将持续到1996年，所有数据将完全供SEMATECH成员公司使用。

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Thermal shock and thermal NF/sub 3/ in-situ furnace cleaning

Initial results from SEMATECH and SEMATECH sponsored research indicate great promise for successful commercial thermal shock and thermal NF/sub 3/ in-situ cleaning of furnace process chambers. Use of the technologies on standard diffusion furnaces is highly flexible depending on a production facility's current capacity and process conditions. Research at SEMATECH aimed at optimizing both methodologies will continue into 1996 with all data being completely accessible to SEMATECH member companies.

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Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop

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