样品称重法测量CVD薄膜厚度

1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings Pub Date : 1996-10-09 DOI:10.1109/SMICND.1996.557407

M. Modreanu, P. Cosmin, S. Cosmin, C. Cobianu, C. Dunare

{"title":"样品称重法测量CVD薄膜厚度","authors":"M. Modreanu, P. Cosmin, S. Cosmin, C. Cobianu, C. Dunare","doi":"10.1109/SMICND.1996.557407","DOIUrl":null,"url":null,"abstract":"Several type of films obtained by the Chemical Vapour Deposition technique, such as silicon dioxide, phosphosilicate glass, silicon oxynitride, silicon nitride and polysilicon, were investigated. A calibration technique for the sample weighing method comprising film density evaluation was developed. The sample weighing method was found to be a fast, precise and non-destructive method for thin film thickness evaluation.","PeriodicalId":266178,"journal":{"name":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","volume":"80 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Measurement of CVD thin films thickness by sample weighing method\",\"authors\":\"M. Modreanu, P. Cosmin, S. Cosmin, C. Cobianu, C. Dunare\",\"doi\":\"10.1109/SMICND.1996.557407\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Several type of films obtained by the Chemical Vapour Deposition technique, such as silicon dioxide, phosphosilicate glass, silicon oxynitride, silicon nitride and polysilicon, were investigated. A calibration technique for the sample weighing method comprising film density evaluation was developed. The sample weighing method was found to be a fast, precise and non-destructive method for thin film thickness evaluation.\",\"PeriodicalId\":266178,\"journal\":{\"name\":\"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings\",\"volume\":\"80 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-10-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.1996.557407\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.1996.557407","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 2

摘要

研究了化学气相沉积技术制备的二氧化硅、磷硅酸盐玻璃、氮化氧硅、氮化硅和多晶硅等薄膜。提出了一种包括膜密度评价在内的样品称重方法的标定技术。样品称重法是一种快速、精确、无损的薄膜厚度测定方法。

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Measurement of CVD thin films thickness by sample weighing method

Several type of films obtained by the Chemical Vapour Deposition technique, such as silicon dioxide, phosphosilicate glass, silicon oxynitride, silicon nitride and polysilicon, were investigated. A calibration technique for the sample weighing method comprising film density evaluation was developed. The sample weighing method was found to be a fast, precise and non-destructive method for thin film thickness evaluation.

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来源期刊

1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings

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