{"title":"利用有限元模型分析银纳米油墨直接冲压过程中的应力分布","authors":"Jiseok Kim, W. Kim","doi":"10.1109/NANO.2014.6967970","DOIUrl":null,"url":null,"abstract":"Mechanical analysis in direct stamping of silver nano ink is simulated by a finite element model, Ansys. Stress distribution on the layer of silver nano ink is predicted while external pressure is applied onto the stamp. Compressive stress over the layer of silver nano ink is approximately the external pressure while higher stress is found at the both side-end of pattern trench. This compressive stress may help to compact silver nano ink in the trench of the stamp to form densified conductive electrode.","PeriodicalId":367660,"journal":{"name":"14th IEEE International Conference on Nanotechnology","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Evaluation of stress distribution in direct stamping of silver nano ink by analysis of finite-element model\",\"authors\":\"Jiseok Kim, W. Kim\",\"doi\":\"10.1109/NANO.2014.6967970\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Mechanical analysis in direct stamping of silver nano ink is simulated by a finite element model, Ansys. Stress distribution on the layer of silver nano ink is predicted while external pressure is applied onto the stamp. Compressive stress over the layer of silver nano ink is approximately the external pressure while higher stress is found at the both side-end of pattern trench. This compressive stress may help to compact silver nano ink in the trench of the stamp to form densified conductive electrode.\",\"PeriodicalId\":367660,\"journal\":{\"name\":\"14th IEEE International Conference on Nanotechnology\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"14th IEEE International Conference on Nanotechnology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/NANO.2014.6967970\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"14th IEEE International Conference on Nanotechnology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NANO.2014.6967970","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Evaluation of stress distribution in direct stamping of silver nano ink by analysis of finite-element model
Mechanical analysis in direct stamping of silver nano ink is simulated by a finite element model, Ansys. Stress distribution on the layer of silver nano ink is predicted while external pressure is applied onto the stamp. Compressive stress over the layer of silver nano ink is approximately the external pressure while higher stress is found at the both side-end of pattern trench. This compressive stress may help to compact silver nano ink in the trench of the stamp to form densified conductive electrode.