K. Furuya, Y. Sakakibara, Koichi Nakanishi, R. Takei, E. Itoga, Masao Suzuki, M. Okano, T. Kamei, M. Mori
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Fine thickness control of amorphous silicon by wet-etching for low loss wire waveguide
Isotropic wet-etching without surface roughening was applied to an a-Si:H film with nanometer-scale thickness controllability. Record ∼1.2 dB/cm low propagation loss was obtained in an etched wire waveguide, being comparable to those of SOI waveguides.
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