{"title":"微机械氮化硅固体浸没透镜","authors":"K. Crozier, D. A. Fletcher, G. Kino, C. Quate","doi":"10.1109/OMEMS.2000.879660","DOIUrl":null,"url":null,"abstract":"We present a method for fabricating silicon nitride solid immersion lenses (SIL) integrated with atomic force microscope cantilevers. We demonstrate that a 200 nm line/space transmission grating (400 nm period) may be resolved using the SIL with /spl lambda/=633 nm illumination. Based on the refractive index (/spl sim/1.9 for PECVD silicon nitride) and geometry of the SIL, the effective numerical aperture is calculated to be /spl sim/1.8.","PeriodicalId":148819,"journal":{"name":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-08-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Micromachined silicon nitride solid immersion lenses\",\"authors\":\"K. Crozier, D. A. Fletcher, G. Kino, C. Quate\",\"doi\":\"10.1109/OMEMS.2000.879660\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present a method for fabricating silicon nitride solid immersion lenses (SIL) integrated with atomic force microscope cantilevers. We demonstrate that a 200 nm line/space transmission grating (400 nm period) may be resolved using the SIL with /spl lambda/=633 nm illumination. Based on the refractive index (/spl sim/1.9 for PECVD silicon nitride) and geometry of the SIL, the effective numerical aperture is calculated to be /spl sim/1.8.\",\"PeriodicalId\":148819,\"journal\":{\"name\":\"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-08-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/OMEMS.2000.879660\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 IEEE/LEOS International Conference on Optical MEMS (Cat. No.00EX399)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMEMS.2000.879660","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
We present a method for fabricating silicon nitride solid immersion lenses (SIL) integrated with atomic force microscope cantilevers. We demonstrate that a 200 nm line/space transmission grating (400 nm period) may be resolved using the SIL with /spl lambda/=633 nm illumination. Based on the refractive index (/spl sim/1.9 for PECVD silicon nitride) and geometry of the SIL, the effective numerical aperture is calculated to be /spl sim/1.8.