栅极凹槽结构对超高速InGaAs/InAlAs hemt截止频率的影响

K. Shinohara, Y. Yamashita, A. Endoh, K. Hikosaka, T. Matsui, S. Hiyamizu, T. Mimura
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引用次数: 15

摘要

我们已经成功地开发了30纳米栅极晶格匹配的InGaAs/InAlAs hemt,其截止频率高达472 GHz,是迄今为止报道的任何晶体管的最高值。我们的HEMT优越的高速特性主要是由于大大减少了横向栅极凹槽长度,同时保持了较小的栅极到通道距离,从而提高了栅极下的平均电子速度。我们制作了非对称凹槽栅极hemt,分别研究了源端和漏侧凹槽长度对f/sub - t/的影响,并澄清了漏侧凹槽对更高的f/sub - t/更为关键。蒙特卡罗模拟结果与实验观察结果一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Importance of gate-recess structure to the cutoff frequency of ultra-high-speed InGaAs/InAlAs HEMTs
We have succeeded in developing 30-nm-gate lattice-matched InGaAs/InAlAs HEMTs with an extremely high cutoff frequency f/sub t/ of 472 GHz, the highest value yet reported for any transistor. The superior high-speed characteristics of our HEMT were mainly due to a much reduced lateral gate-recess length while maintaining a small gate-to-channel distance, which enhanced the average electron velocity under the gate. We fabricated asymmetrically recessed-gate HEMTs to separately investigate the effect of source- and drain-side recess lengths on f/sub t/, and clarified that the drain-side recess is more critical to a superior f/sub t/. Monte Carlo simulation results were consistent with the experimental observations.
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