低亚阈值摆动隧道晶体管的解析表达式与方法

Qin Zhang, Wei Zhao, A. Seabaugh
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引用次数: 29

摘要

最近Appenzeller[1]在碳纳米管中对带间隧道晶体管进行的实验演示,以及Bhuwalka[2]对垂直Si/SiGe p-i-n带间隧道晶体管的模拟表明,在隧道晶体管中可以实现40 mV/ 10年或更小的亚阈值振荡。本文推导了隧道晶体管亚阈值振荡的简单解析表达式,表明隧道晶体管中有两种物理机制可以优化以实现低亚阈值振荡。在此基础上,我们提出了一种新的绝缘体上硅隧道晶体管,以实现低亚阈值摆幅,从而显著降低数字逻辑器件的功耗。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytic expression and approach for low subthreshold-swing tunnel transistors
Recent experimental demonstrations of interband tunnel transistors by Appenzeller [1], in carbon nanotubes, and simulations by Bhuwalka [2], of vertical Si/SiGe p-i-n interband tunnel transistors show that subthreshold swings of 40 mV/decade or less can be achieved in tunneling transistors. We derive here, a simple analytic expression for the subthreshold swing in tunnel transistors which shows that there are two physical mechanisms in tunnel transistors which can be optimized to achieve low subthreshold swings. Extending from this analysis we propose a new silicon-on-insulator tunnel transistor to achieve low subthreshold swing toward significantly lowering power in digital logic devices.
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