{"title":"晶圆厂实施清洁晶圆的系统,使其在晶圆破碎事件中幸存下来","authors":"D. Hilscher","doi":"10.1109/ASMC.1998.731480","DOIUrl":null,"url":null,"abstract":"Wafer-breakage events are detrimental to the productivity of a semiconductor fab in two ways. The loss of product revenue is obvious, but more subtle is the yield impact of wafers in proximity to the breakage event. This collateral damage can impact the final test yield of the surviving wafers, as well as potentially contaminate tools which subsequently process these wafers. This paper describes the evolution and factory-wide implementation of a system for rework cleaning of such wafers, and an estimate of the yield improvement from its implementation.","PeriodicalId":290016,"journal":{"name":"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Fab implementation of a system for cleaning wafers which survive wafer-breakage events\",\"authors\":\"D. Hilscher\",\"doi\":\"10.1109/ASMC.1998.731480\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Wafer-breakage events are detrimental to the productivity of a semiconductor fab in two ways. The loss of product revenue is obvious, but more subtle is the yield impact of wafers in proximity to the breakage event. This collateral damage can impact the final test yield of the surviving wafers, as well as potentially contaminate tools which subsequently process these wafers. This paper describes the evolution and factory-wide implementation of a system for rework cleaning of such wafers, and an estimate of the yield improvement from its implementation.\",\"PeriodicalId\":290016,\"journal\":{\"name\":\"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-09-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1998.731480\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1998.731480","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fab implementation of a system for cleaning wafers which survive wafer-breakage events
Wafer-breakage events are detrimental to the productivity of a semiconductor fab in two ways. The loss of product revenue is obvious, but more subtle is the yield impact of wafers in proximity to the breakage event. This collateral damage can impact the final test yield of the surviving wafers, as well as potentially contaminate tools which subsequently process these wafers. This paper describes the evolution and factory-wide implementation of a system for rework cleaning of such wafers, and an estimate of the yield improvement from its implementation.