{"title":"0.35 /spl mu/m, 43 /spl mu//spl Omega/cm/sup 2/, 6 m/spl Omega/功率MOSFET为未来的微处理器供电","authors":"N. Sun, A.Q. Huang, F.C. Lee","doi":"10.1109/ISPSD.1999.764058","DOIUrl":null,"url":null,"abstract":"In this paper, a lateral power MOSFET using 0.35 /spl mu/m VLSI CMOS technology is demonstrated to have a 6 m/spl Omega/ on-resistance and a gate charge of 2.7 nC. For high frequency, low voltage power switching conversion applications, the deep sub-micron CMOS/BiCMOS based technology is clearly superior to conventional vertical power MOSFET technology.","PeriodicalId":352185,"journal":{"name":"11th International Symposium on Power Semiconductor Devices and ICs. ISPSD'99 Proceedings (Cat. No.99CH36312)","volume":"150 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-05-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"0.35 /spl mu/m, 43 /spl mu//spl Omega/cm/sup 2/, 6 m/spl Omega/ power MOSFET to power future microprocessor\",\"authors\":\"N. Sun, A.Q. Huang, F.C. Lee\",\"doi\":\"10.1109/ISPSD.1999.764058\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, a lateral power MOSFET using 0.35 /spl mu/m VLSI CMOS technology is demonstrated to have a 6 m/spl Omega/ on-resistance and a gate charge of 2.7 nC. For high frequency, low voltage power switching conversion applications, the deep sub-micron CMOS/BiCMOS based technology is clearly superior to conventional vertical power MOSFET technology.\",\"PeriodicalId\":352185,\"journal\":{\"name\":\"11th International Symposium on Power Semiconductor Devices and ICs. ISPSD'99 Proceedings (Cat. No.99CH36312)\",\"volume\":\"150 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-05-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"11th International Symposium on Power Semiconductor Devices and ICs. ISPSD'99 Proceedings (Cat. No.99CH36312)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.1999.764058\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"11th International Symposium on Power Semiconductor Devices and ICs. ISPSD'99 Proceedings (Cat. No.99CH36312)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.1999.764058","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
0.35 /spl mu/m, 43 /spl mu//spl Omega/cm/sup 2/, 6 m/spl Omega/ power MOSFET to power future microprocessor
In this paper, a lateral power MOSFET using 0.35 /spl mu/m VLSI CMOS technology is demonstrated to have a 6 m/spl Omega/ on-resistance and a gate charge of 2.7 nC. For high frequency, low voltage power switching conversion applications, the deep sub-micron CMOS/BiCMOS based technology is clearly superior to conventional vertical power MOSFET technology.