ZnO纳米棒覆盖的SrTiO3:Er薄膜在光致发光中的激子-声子效率提高

Shean-Yih Lee, Shich-Chuan Wu, P. Yang
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摘要

研究了溅射法制备不同表面形貌的掺铒SrTiO3 (STO: Er)薄膜的发光特性。在ZnO纳米棒上覆盖掺铒STO薄膜的发光效率均高于直接沉积在Si(100)衬底上的薄膜。采用简单的水溶液法在低温条件下制备了一维排列良好的ZnO纳米棒。在掺铒STO薄膜中,发光效率与Er3+浓度和退火温度的关系受结晶度和离子-离子相互作用的影响。对ZnO纳米棒上覆盖的掺铒STO薄膜的光致发光(PL)测量表明,当退火温度为700℃,Er3+掺杂浓度为3 mol%时,薄膜的绿光强度明显增强。当Er浓度超过3mol %时,簇的存在会降低发射强度。此外,掺杂5 mol% Er的STO薄膜出现了浓度猝灭现象。这一现象归因于STO晶格中位置紧密的Er3+离子之间的能量转移和交叉弛豫。我们还发现发光强度的猝灭机制与掺铒浓度和退火温度有明显的关系。光致发光性能表明,在ZnO纳米棒上添加3mol %掺铒的STO薄膜是光电器件应用的最佳选择。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhanced exciton-phonon efficiency in photoluminescence of SrTiO3 :Er films covered on ZnO nanorods
Characteristics of light emission of Er-doped SrTiO3 (STO) thin films (STO : Er) deposited on different surface morphologies by a sputtering technique were investigated. The luminescence efficiency of Er-doped STO films covered on ZnO nanorods was greater than deposited directly on Si (100) substrates in all specimens. Formation of one-dimensional well-aligned ZnO nanorods has been achieved using a simple aqueous solution method at low temperatures. The dependence of luminescence efficiency on Er3+ concentrations and annealing temperatures in the Er-doped STO films is governed by crystallinity and ion-ion interaction. The photoluminescence (PL) measurement of the Er-doped STO films covered on ZnO nanorods show that the much stronger intensity of green light is observed at annealing temperature 700 °C and 3 mol% Er3+ -doped concentration. The presence of clusters as the Er concentration exceed 3 mol% will diminish the emission intensity. Besides, concentration quenching was observed on STO films containing 5 mol% Er dopant. The phenomenon was attributed to energy transference and cross relaxation between closely sited Er3+ ions in the STO lattice. We also showed that the quenching mechanism of the luminescent intensity is evidently relational with Er-doped concentrations and annealing temperatures. The photoluminescence properties suggest that adding a 3 mol% Er-doped STO films covered on ZnO nanorods is the optimal choice for optoelectronic device applications.
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