用于低维金属条制造和测量的原子力显微镜

2011 International Students and Young Scientists Workshop "Photonics and Microsystems" Pub Date : 2011-07-08 DOI:10.1109/STYSW.2011.6155848

M. Ramiączek-Krasowska, A. Szyszka, J. Prażmowska, R. Paszkiewicz

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引用次数: 0

摘要

本文介绍了光刻技术。并对利用AFM系统的光刻技术进行了总结。在工作中，展示和讨论了纳米刮擦和剥离技术所产生的图案的重建。在一定的纳米划痕参数下，确定了生成结构的分辨率。重建图像的分辨率约为120 nm，与金掩蔽层的厚度相当。

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Atomic force microscopy for low dimensional metal strips creation and measurements

In the paper the lithography methods are presented. Also a lithography with use AFM systems is summarized. In the work the reconstruction of the pattern created by nanoscratching and lift-off technique is show and discussed. The resolution of created structures for certain parameters of nanoscratching was also defined. Obtained resolution of reconstructed pattern was about 120 nm what was comparable with the thickness of gold masking layer.

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2011 International Students and Young Scientists Workshop "Photonics and Microsystems"

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