90nm浮栅“B4-Flash”存储技术——突破NOR闪存栅长度限制

T. Ogura, M. Mihara, Y. Kawajiri, K. Kobayashi, S. Shimizu, S. Shukuri, N. Ajika, M. Nakashima
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引用次数: 6

摘要

采用64 Mbit测试芯片,研究了具有IF (F:最小特征尺寸)栅极长度单元的90 nm浮栅NOR b4闪存,以评估b4闪存的可扩展性。90 nm (=1F)的栅极长度是目前报道的NOR闪存中最短的。研究了基于NMOS选择晶体管存储单元阵列的b4闪存的基本程序和擦除特性及鲁棒程序抗干扰能力。此外,为了简化外围电路和减小芯片尺寸,本文还引入了一种新的电荷泵电路,该电路可以在1.8 V的电源电压下产生正、负高压。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 90nm Floating Gate "B4-Flash" Memory Technology- Breakthrough of the Gate Length Limitation on NOR Flash Memory
A 90 nm floating gate NOR B4-Flash memory with IF (F: minimum feature size) gate length cell has been investigated by using 64 Mbit test chip to evaluate the scalability of B4-Flash memory. 90 nm (=1F) gate length of memory cell is shortest in many NOR flash memories reported previously. Basic program and erase characteristics and robust program disturb immunity of B4-Flash memory utilizing NMOS select transistor in memory cell array have been demonstrated. Furthermore, to simplify the peripheral circuits and reduce a die size, a new charge pump circuit which can generate both positive and negative high voltage at a supply voltage of 1.8 V has been introduced.
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