MBE生长GaAlAs/GaAs/GaAlAs量子阱异质结构中能带偏移的测定:DLTS和静水压力下光致发光的应用

A. K. Saxena
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引用次数: 0

摘要

结果表明,利用肖特基势垒二极管对量子阱异质结构进行电容光谱分析,结合光致发光(PL)测量,可以有效地测定导带不连续和价带不连续,它们分别占带隙差的72%和28%。电子捕获表示库仑排斥场。C-V测量也被解释为在地表下物理定位井的位置,其结果与电化学剖面的值非常吻合。此外,静水压力下的电容光谱已被用于识别量子阱和体阱的发射。在顶部的GaAlAs层也检测到0.84 eV和0.73 eV两个电子体阱,0.84 eV能级可能是镓空位和砷镓反位缺陷的复合物。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Determination of band off-sets in MBE grown GaAlAs/GaAs/GaAlAs quantum well heterostructures: application of DLTS and photoluminescence under hydrostatic pressure
It is shown that capacitance spectroscopy on quantum well heterostructures using Schottky barrier diodes, combined with photoluminescence (PL) measurements provides a powerful tool in determining conduction and valence band discontinuities, which are determined to be 72% and 28% of the band gap difference. The electron capture is indicative of a Coulomb's repulsive field. The C-V measurements have also been interpreted to physically locate the position of the well under the surface and the result agrees closely with the value of electrochemical profiling. Further, capacitance spectroscopy under hydrostatic pressure has been used to identify the quantum well and bulk trap emissions. Two electron bulk traps at 0.84 eV and 0.73 eV in the top GaAlAs layer were also detected and the 0.84 eV level is possibly a complex of gallium vacancy and arsenic-gallium antisite defect.
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