VLSI GaAs mesfet上led的MBE再生

K. V. Shenoy, C. Fonstad, A. Grot, D. Psaltis
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引用次数: 3

摘要

只提供摘要形式。异质结构发光二极管(led)在完全加工的VLSI GaAs mesfet上的再生和单片集成已经被证明。市场上可买到的自校准VLSI GaAs MESFET具有钨基难熔金属肖特基栅极、镍基难熔金属欧姆触点和铝互连金属化,在525℃或10℃下加热3小时后保持稳定。因此,现在可以通过低温分子束外延(MBE)在完全加工的MESFET电路上再生光源。这使得人们可以构建具有光输入和光输出的高密度、复杂的电子电路。光电神经元阵列被认为是光神经网络的一个应用。>
本文章由计算机程序翻译,如有差异,请以英文原文为准。
MBE regrowth of LEDs on VLSI GaAs MESFETs
Summary form only given. The regrowth and monolithic integration of heterostructure light-emitting diodes (LEDs) on fully processed VLSI GaAs MESFETs have been demonstrated. Commercially available, self-aligned VLSI GaAs MESFETs with tungsten-based refractory-metal Schottky gates, nickel-based refractory-metal ohmic contacts, and aluminum interconnection metallization have been shown to be stable after 3 h to 525 degrees C+or-10 degrees C. Thus, it is now possible to regrow optical sources on fully processed MESFET circuitry with lowered-temperature molecular beam epitaxy (MBE). This allows one to build high-density, complex electronic circuitry with optical inputs and optical outputs. Optoelectronic neuron arrays in optical neural networks are considered as an application. >
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