高表面平整度的超大单级衍射光栅的制备

Yilei Hua, Changqing Xie, Nan Gao, Xiaoli Zhu, Hailiang Li
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引用次数: 1

摘要

在这项工作中,我们提出了一个大(100mmx40mm)和厚(30mm)的单级衍射光栅的制造工艺,具有非常平坦的反射面。该光栅是为软x射线单色仪设计的。将三个线密度不同的单阶衍射光栅集成在一块硅板上。光栅图案在6.35毫米厚的基板上使用直接电子束写入和蚀刻使用高密度等离子体。然后将光栅粘在23.7毫米厚的大块硅上。对光栅表面的平整度进行了控制,并用干涉仪进行了测试,测试结果表明,光栅表面的峰谷值小于60nm,满足软x射线单色仪的要求。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fabrication of ultralarge single order diffraction grating with high surface flatness
In this work, we present the fabrication process of a large (100mmx40mm) and thick (30mm) single order diffraction grating with a very flat reflecting surface. This grating is designed for a soft X-ray monochromator. Three single order diffraction gratings with different line densities were integrated on one silicon plate. The gratings are patterned on a 6.35mm thick substrate using direct e-beam writing and etched using high density plasma. Then the grating is glued on to a 23.7mm thick bulk silicon. The flatness of the surface of the gratings was well controlled and tested with an interferometer, the test results show that the peak-to-valley value of the surface is less than 60nm, which meet the requirement for a soft X-ray monochromator.
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