单层tmdfet的谷分辨电流成分分析

U. Sahu, A. Saha, P. Gupta, H. Rahaman
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引用次数: 1

摘要

继硅之后,半导体二维过渡金属双硫化物单层(TMDs)晶体成为未来一代晶体管超薄通道材料的有利候选材料。然而,制造这些晶体作为具有可接受性能的通道材料仍然具有挑战性。在单层半导体tmd中直接带隙(1-2eV)的存在,以及电介质工程对迁移率的改善,为未来的电子应用开辟了无限的空间。在本工作中,我们计算研究了导带的第二最低谷(Q谷约介于K和Γ之间)对单层TMD基mosfet (tmdfet)器件性能的贡献。从我们的计算中,我们发现Q谷的贡献是不可忽略的,因为导带最小值(CBM)和第二低谷(ΔEc)之间的能量差非常小,约为2kT。Q谷的谷简并度为6,而K谷的谷简并度为2。因此,我们可以说K谷和Q谷的占用率非常接近。因此,两个山谷对运输船运输同样重要。在我们的研究中,我们发现,在目前的计算中,所有半导体单层tmd的第二低谷的贡献是非常显著的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Valley Resolved Current Components Analysis of Monolayer TMDFETs
After silicon, semiconducting 2D transition metal dichalcogenide monolayers (TMDs) crystals are coming up as favorable candidate in ultra-thin channels material in the future generation of transistors. However, fabrication of these crystals as channel materials with acceptable performance is still challenging. Presence of direct bandgaps (1–2eV) in monolayer semiconducting TMDs, along with mobility improvement by dielectric engineering, It opens up a boundless scope in future electronic applications. In present work, we give a computational study on contribution of the second-lowest valley (Q valley about midway between K and Γ) of conduction band on device performance in monolayer TMD based MOSFETs (TMDFETs). From our calculation, we have found that the contribution of Q valley is not negligible, as the energy difference between conduction band minima (CBM) and second lowest valley (ΔEc) is very small and it is around 2kT. Q valley has valley degeneracy of 6, compared with valley degeneracy 2 for K Valley in the conduction band. So, we can say that the occupancy of ‘K’ valley and ‘Q’ valley is very close to each other. Hence two valleys are equally important for carrier transport. In our studies, we have found, the contribution of the second-lowest valley of all semiconducting monolayer TMDs in the current calculation is very significant.
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