SiC DMOSFET异常偏置温度不稳定性

Z. Chbili, K. Cheung, P. Campbell, J. Suehle, D. Ioannou, S. Ryu, A. Lelis
{"title":"SiC DMOSFET异常偏置温度不稳定性","authors":"Z. Chbili, K. Cheung, P. Campbell, J. Suehle, D. Ioannou, S. Ryu, A. Lelis","doi":"10.1109/IIRW.2013.6804166","DOIUrl":null,"url":null,"abstract":"We observe an unusual instability in the SiC DMOSFET transistor characteristics. From a series of bias conditions at elevated temperatures, we conclude that a high density of hole traps in the oxide near the SiO2/SiC interface are responsible.","PeriodicalId":287904,"journal":{"name":"2013 IEEE International Integrated Reliability Workshop Final Report","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Unusual bias temperature instability in SiC DMOSFET\",\"authors\":\"Z. Chbili, K. Cheung, P. Campbell, J. Suehle, D. Ioannou, S. Ryu, A. Lelis\",\"doi\":\"10.1109/IIRW.2013.6804166\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We observe an unusual instability in the SiC DMOSFET transistor characteristics. From a series of bias conditions at elevated temperatures, we conclude that a high density of hole traps in the oxide near the SiO2/SiC interface are responsible.\",\"PeriodicalId\":287904,\"journal\":{\"name\":\"2013 IEEE International Integrated Reliability Workshop Final Report\",\"volume\":\"17 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 IEEE International Integrated Reliability Workshop Final Report\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IIRW.2013.6804166\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE International Integrated Reliability Workshop Final Report","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IIRW.2013.6804166","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

摘要

我们观察到SiC DMOSFET晶体管特性中不寻常的不稳定性。从高温下的一系列偏置条件中,我们得出结论,SiO2/SiC界面附近的氧化物中高密度的空穴陷阱是负责任的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Unusual bias temperature instability in SiC DMOSFET
We observe an unusual instability in the SiC DMOSFET transistor characteristics. From a series of bias conditions at elevated temperatures, we conclude that a high density of hole traps in the oxide near the SiO2/SiC interface are responsible.
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