{"title":"200mm光刻i线生产区域整体周期时间分析及改进项目","authors":"T. Zarbock, F. Lehmann, J. Fellendorf","doi":"10.1109/ASMC.2006.1638736","DOIUrl":null,"url":null,"abstract":"In this paper, a holistic approach for analyzing and improving a work center's performance focusing on cycle time improvement is described. We give an insight into the setup and execution of the project as well as achieved results and success factors. Also, lessons learned within this project are shared","PeriodicalId":407645,"journal":{"name":"The 17th Annual SEMI/IEEE ASMC 2006 Conference","volume":"25 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Holistic Cycle Time Analysis and Improvement Project within a 200mm Lithography I-line Production Area\",\"authors\":\"T. Zarbock, F. Lehmann, J. Fellendorf\",\"doi\":\"10.1109/ASMC.2006.1638736\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, a holistic approach for analyzing and improving a work center's performance focusing on cycle time improvement is described. We give an insight into the setup and execution of the project as well as achieved results and success factors. Also, lessons learned within this project are shared\",\"PeriodicalId\":407645,\"journal\":{\"name\":\"The 17th Annual SEMI/IEEE ASMC 2006 Conference\",\"volume\":\"25 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-05-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"The 17th Annual SEMI/IEEE ASMC 2006 Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2006.1638736\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"The 17th Annual SEMI/IEEE ASMC 2006 Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2006.1638736","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Holistic Cycle Time Analysis and Improvement Project within a 200mm Lithography I-line Production Area
In this paper, a holistic approach for analyzing and improving a work center's performance focusing on cycle time improvement is described. We give an insight into the setup and execution of the project as well as achieved results and success factors. Also, lessons learned within this project are shared