通过实施反馈过程控制打破FAB约束

K. Takagaki, N. Matsumoto, L. Idera, T. Ishijima, Y. Ueda
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引用次数: 0

摘要

提出了一种基于PC机的过程控制支持工具的反馈过程控制模型,并将其应用于光学光刻过程中的覆盖和曝光瓶颈。它成功地打破了瓶颈。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Breaking FAB constraint with implementing feedback process control
We present a feed back process control model on a PC based process control support tool which was applied to the bottleneck of overlay and expose process in optical lithography process. It was successful in breaking the bottleneck.
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